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Titre
Towards fabrication of 3D isotopically modulated vertical silicon nanowires in selective areas by nanosphere lithography
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BSO - Titre
Towards fabrication of 3D isotopically modulated vertical silicon nanowires in selective areas by nanosphere lithography
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DOI
DOI
10.1016/j.mee.2017.04.030
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DOAI
DOAI
10.1016/j.mee.2017.04.030
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Identifiant WoS
WOS:000404798900012
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Accès ouvert
OA - Non
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Source - Accès ouvert
OA - Non
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Type d'accès
Non OA
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Editeur
Elsevier
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Source
MICROELECTRONIC ENGINEERING
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ISSN
0167-9317
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Type de document
Article
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Notoriété
3 - Correcte
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CNRS
Oui
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CNRS - Institut
INP - Institut de physique
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uid:/GSP9069L
12/10/2021 14:52:46 (latest)
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